10.5. - 11.5.
New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics are discussed by more than 100 participants from industry, research institutes and universities.
In this series of annual workshops, NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss recent experimental results on devices, process technology, reliability, and characterization of high-k dielectrics integrated into silicon-based micro- and nanoelectronics. As in previous years, the causes for the formation of ferroelectric properties in HfO2 and ZrO2 and the application of these films will be discussed.
Verkauf endet am Donnerstag, 11.05.2023 08:00
Wednesday May 10th
Thursday May 11th
Preise inkl. Steuern
High k Application Workshop 2023 wird organisiert durch: